Machining of [100], [110] and [111] oriented silicon with ultrashort laser pulses in the NIR

Neuenschwander, Beat; Remund, Stefan; Wildbolz, Christoph August; Chaja, Michalina; Molpeceres, Carlos; Narazaki, Aiko; Qiao, Jie (2021). Machining of [100], [110] and [111] oriented silicon with ultrashort laser pulses in the NIR In: Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVI (p. 21). SPIE 10.1117/12.2582661

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[100], [110] and [111] oriented silicon shows different behavior when it is machined with 10 ps pulses in the NIR. For the [100] orientation the roughness increases to 2.8 µm when the peak fluence is raised to 1.6 J/cm2 then drops down to a value below 200 nm for a fluence of 2 J/cm2 and stays below 300nm for fluences up to 7.5 J/cm2. For the other orientations a completely different behavior is observed. The roughness constantly increases to 900 nm at 1.6 J/cm2 and then further to about 8 µm for a peak fluence of 7.5 J/cm2.

Item Type:	Conference or Workshop Item (Paper)
Division/Institute:	School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS > ALPS / Laser Surface Engineering
Name:	Neuenschwander, Beat0000-0001-9715-8557; Remund, Stefan; Wildbolz, Christoph August; Chaja, Michalina; Molpeceres, Carlos; Narazaki, Aiko and Qiao, Jie
Subjects:	Q Science > QC Physics T Technology > TJ Mechanical engineering and machinery
ISBN:	9781510641822
Publisher:	SPIE
Language:	English
Submitter:	Beat Neuenschwander
Date Deposited:	02 Aug 2021 16:07
Last Modified:	04 Nov 2021 21:46
Publisher DOI:	10.1117/12.2582661
URI:	https://arbor.bfh.ch/id/eprint/15218