Neuenschwander, Beat; Remund, Stefan; Wildbolz, Christoph August; Chaja, Michalina; Molpeceres, Carlos; Narazaki, Aiko; Qiao, Jie (2021). Machining of [100], [110] and [111] oriented silicon with ultrashort laser pulses in the NIR In: Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXVI (p. 21). SPIE 10.1117/12.2582661
Full text not available from this repository. (Request a copy)[100], [110] and [111] oriented silicon shows different behavior when it is machined with 10 ps pulses in the NIR. For the [100] orientation the roughness increases to 2.8 µm when the peak fluence is raised to 1.6 J/cm2 then drops down to a value below 200 nm for a fluence of 2 J/cm2 and stays below 300nm for fluences up to 7.5 J/cm2. For the other orientations a completely different behavior is observed. The roughness constantly increases to 900 nm at 1.6 J/cm2 and then further to about 8 µm for a peak fluence of 7.5 J/cm2.
Item Type: |
Conference or Workshop Item (Paper) |
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Division/Institute: |
School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS > ALPS / Laser Surface Engineering |
Name: |
Neuenschwander, Beat0000-0001-9715-8557; Remund, Stefan; Wildbolz, Christoph August; Chaja, Michalina; Molpeceres, Carlos; Narazaki, Aiko and Qiao, Jie |
Subjects: |
Q Science > QC Physics T Technology > TJ Mechanical engineering and machinery |
ISBN: |
9781510641822 |
Publisher: |
SPIE |
Language: |
English |
Submitter: |
Beat Neuenschwander |
Date Deposited: |
02 Aug 2021 16:07 |
Last Modified: |
04 Nov 2021 21:46 |
Publisher DOI: |
10.1117/12.2582661 |
URI: |
https://arbor.bfh.ch/id/eprint/15218 |