School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS > ALPS / Plasma Surface Engineering

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Number of items at this level: 39.

Antonin, Olivier

Schoeppner, Rachel L.; Putz, Barbara; Taylor, Aidan A.; Pethö, Laszlo; Keith, Thomas; Antonin, Olivier; Nelis, Thomas; Michler, Johann (2021). Combinatorial Materials Design Approach to Investigate Adhesion Layer Chemistry for Optimal Interfacial Adhesion Strength Crystals, 11(357) MDPI https://doi.org/10.3390/cryst11040357

Bensaoula, Abdelhak

Lapeyre, L.; Wieczerzak, K.; Hain, Caroline; Metzger, J.; Sharma, A.; Bensaoula, Abdelhak; Michler, J.; Nelis, Thomas (2022). Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films Surface and Coatings Technology, 450, p. 129002. Elsevier 10.1016/j.surfcoat.2022.129002

Brown, David

Hain, Caroline; Brown, David; Welsh, Alexander; Wieczerzak, Krzystof; Weiss, Robert; Michler, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2022). From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films Surface and Coatings Technology, 432, p. 127928. Elsevier 10.1016/j.surfcoat.2021.127928

Brozi, Aurelio

Hain, Caroline; Schweizer, Peter; Sturm, Patrick; Brozi, Aurelio; Thomet, Jonathan; Micher, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2023). Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation Surface and Coatings Technology, 454, p. 129188. Elsevier 10.1016/j.surfcoat.2022.129188

Groetsch, Alexander

Xomalis, Angelos; Hain, Caroline; Groetsch, Alexander; Klimashin, Fedor F.; Nelis, Thomas; Michler, Johann; Schwiedrzik, Jakob (2023). Resist-Free E-beam Lithography for Patterning Nanoscale Thick Films on Flexible Substrates ACS Applied Nano Material, 6(5), pp. 3388-3394. American Chemical Society 10.1021/acsanm.2c05161

Hain, Caroline

Hain, Caroline; Schweizer, Peter; Sturm, Patrick; Brozi, Aurelio; Thomet, Jonathan; Micher, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2023). Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation Surface and Coatings Technology, 454, p. 129188. Elsevier 10.1016/j.surfcoat.2022.129188

Xomalis, Angelos; Hain, Caroline; Groetsch, Alexander; Klimashin, Fedor F.; Nelis, Thomas; Michler, Johann; Schwiedrzik, Jakob (2023). Resist-Free E-beam Lithography for Patterning Nanoscale Thick Films on Flexible Substrates ACS Applied Nano Material, 6(5), pp. 3388-3394. American Chemical Society 10.1021/acsanm.2c05161

Hain, Caroline; Brown, David; Welsh, Alexander; Wieczerzak, Krzystof; Weiss, Robert; Michler, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2022). From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films Surface and Coatings Technology, 432, p. 127928. Elsevier 10.1016/j.surfcoat.2021.127928

Lapeyre, L.; Wieczerzak, K.; Hain, Caroline; Metzger, J.; Sharma, A.; Bensaoula, Abdelhak; Michler, J.; Nelis, Thomas (2022). Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films Surface and Coatings Technology, 450, p. 129002. Elsevier 10.1016/j.surfcoat.2022.129002

Hessler-Wyser, Aicha

Hain, Caroline; Schweizer, Peter; Sturm, Patrick; Brozi, Aurelio; Thomet, Jonathan; Micher, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2023). Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation Surface and Coatings Technology, 454, p. 129188. Elsevier 10.1016/j.surfcoat.2022.129188

Hain, Caroline; Brown, David; Welsh, Alexander; Wieczerzak, Krzystof; Weiss, Robert; Michler, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2022). From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films Surface and Coatings Technology, 432, p. 127928. Elsevier 10.1016/j.surfcoat.2021.127928

Keith, Thomas

Schoeppner, Rachel L.; Putz, Barbara; Taylor, Aidan A.; Pethö, Laszlo; Keith, Thomas; Antonin, Olivier; Nelis, Thomas; Michler, Johann (2021). Combinatorial Materials Design Approach to Investigate Adhesion Layer Chemistry for Optimal Interfacial Adhesion Strength Crystals, 11(357) MDPI https://doi.org/10.3390/cryst11040357

Klimashin, Fedor F.

Xomalis, Angelos; Hain, Caroline; Groetsch, Alexander; Klimashin, Fedor F.; Nelis, Thomas; Michler, Johann; Schwiedrzik, Jakob (2023). Resist-Free E-beam Lithography for Patterning Nanoscale Thick Films on Flexible Substrates ACS Applied Nano Material, 6(5), pp. 3388-3394. American Chemical Society 10.1021/acsanm.2c05161

Lapeyre, L.

Lapeyre, L.; Wieczerzak, K.; Hain, Caroline; Metzger, J.; Sharma, A.; Bensaoula, Abdelhak; Michler, J.; Nelis, Thomas (2022). Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films Surface and Coatings Technology, 450, p. 129002. Elsevier 10.1016/j.surfcoat.2022.129002

Metzger, J.

Lapeyre, L.; Wieczerzak, K.; Hain, Caroline; Metzger, J.; Sharma, A.; Bensaoula, Abdelhak; Michler, J.; Nelis, Thomas (2022). Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films Surface and Coatings Technology, 450, p. 129002. Elsevier 10.1016/j.surfcoat.2022.129002

Micher, Johann

Hain, Caroline; Schweizer, Peter; Sturm, Patrick; Brozi, Aurelio; Thomet, Jonathan; Micher, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2023). Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation Surface and Coatings Technology, 454, p. 129188. Elsevier 10.1016/j.surfcoat.2022.129188

Michler, J.

Lapeyre, L.; Wieczerzak, K.; Hain, Caroline; Metzger, J.; Sharma, A.; Bensaoula, Abdelhak; Michler, J.; Nelis, Thomas (2022). Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films Surface and Coatings Technology, 450, p. 129002. Elsevier 10.1016/j.surfcoat.2022.129002

Michler, Johann

Xomalis, Angelos; Hain, Caroline; Groetsch, Alexander; Klimashin, Fedor F.; Nelis, Thomas; Michler, Johann; Schwiedrzik, Jakob (2023). Resist-Free E-beam Lithography for Patterning Nanoscale Thick Films on Flexible Substrates ACS Applied Nano Material, 6(5), pp. 3388-3394. American Chemical Society 10.1021/acsanm.2c05161

Hain, Caroline; Brown, David; Welsh, Alexander; Wieczerzak, Krzystof; Weiss, Robert; Michler, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2022). From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films Surface and Coatings Technology, 432, p. 127928. Elsevier 10.1016/j.surfcoat.2021.127928

Schoeppner, Rachel L.; Putz, Barbara; Taylor, Aidan A.; Pethö, Laszlo; Keith, Thomas; Antonin, Olivier; Nelis, Thomas; Michler, Johann (2021). Combinatorial Materials Design Approach to Investigate Adhesion Layer Chemistry for Optimal Interfacial Adhesion Strength Crystals, 11(357) MDPI https://doi.org/10.3390/cryst11040357

Nelis, Thomas

Hain, Caroline; Schweizer, Peter; Sturm, Patrick; Brozi, Aurelio; Thomet, Jonathan; Micher, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2023). Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation Surface and Coatings Technology, 454, p. 129188. Elsevier 10.1016/j.surfcoat.2022.129188

Xomalis, Angelos; Hain, Caroline; Groetsch, Alexander; Klimashin, Fedor F.; Nelis, Thomas; Michler, Johann; Schwiedrzik, Jakob (2023). Resist-Free E-beam Lithography for Patterning Nanoscale Thick Films on Flexible Substrates ACS Applied Nano Material, 6(5), pp. 3388-3394. American Chemical Society 10.1021/acsanm.2c05161

Hain, Caroline; Brown, David; Welsh, Alexander; Wieczerzak, Krzystof; Weiss, Robert; Michler, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2022). From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films Surface and Coatings Technology, 432, p. 127928. Elsevier 10.1016/j.surfcoat.2021.127928

Lapeyre, L.; Wieczerzak, K.; Hain, Caroline; Metzger, J.; Sharma, A.; Bensaoula, Abdelhak; Michler, J.; Nelis, Thomas (2022). Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films Surface and Coatings Technology, 450, p. 129002. Elsevier 10.1016/j.surfcoat.2022.129002

Schoeppner, Rachel L.; Putz, Barbara; Taylor, Aidan A.; Pethö, Laszlo; Keith, Thomas; Antonin, Olivier; Nelis, Thomas; Michler, Johann (2021). Combinatorial Materials Design Approach to Investigate Adhesion Layer Chemistry for Optimal Interfacial Adhesion Strength Crystals, 11(357) MDPI https://doi.org/10.3390/cryst11040357

Pethö, Laszlo

Schoeppner, Rachel L.; Putz, Barbara; Taylor, Aidan A.; Pethö, Laszlo; Keith, Thomas; Antonin, Olivier; Nelis, Thomas; Michler, Johann (2021). Combinatorial Materials Design Approach to Investigate Adhesion Layer Chemistry for Optimal Interfacial Adhesion Strength Crystals, 11(357) MDPI https://doi.org/10.3390/cryst11040357

Putz, Barbara

Schoeppner, Rachel L.; Putz, Barbara; Taylor, Aidan A.; Pethö, Laszlo; Keith, Thomas; Antonin, Olivier; Nelis, Thomas; Michler, Johann (2021). Combinatorial Materials Design Approach to Investigate Adhesion Layer Chemistry for Optimal Interfacial Adhesion Strength Crystals, 11(357) MDPI https://doi.org/10.3390/cryst11040357

Schoeppner, Rachel L.

Schoeppner, Rachel L.; Putz, Barbara; Taylor, Aidan A.; Pethö, Laszlo; Keith, Thomas; Antonin, Olivier; Nelis, Thomas; Michler, Johann (2021). Combinatorial Materials Design Approach to Investigate Adhesion Layer Chemistry for Optimal Interfacial Adhesion Strength Crystals, 11(357) MDPI https://doi.org/10.3390/cryst11040357

Schweizer, Peter

Hain, Caroline; Schweizer, Peter; Sturm, Patrick; Brozi, Aurelio; Thomet, Jonathan; Micher, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2023). Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation Surface and Coatings Technology, 454, p. 129188. Elsevier 10.1016/j.surfcoat.2022.129188

Schwiedrzik, Jakob

Xomalis, Angelos; Hain, Caroline; Groetsch, Alexander; Klimashin, Fedor F.; Nelis, Thomas; Michler, Johann; Schwiedrzik, Jakob (2023). Resist-Free E-beam Lithography for Patterning Nanoscale Thick Films on Flexible Substrates ACS Applied Nano Material, 6(5), pp. 3388-3394. American Chemical Society 10.1021/acsanm.2c05161

Sharma, A.

Lapeyre, L.; Wieczerzak, K.; Hain, Caroline; Metzger, J.; Sharma, A.; Bensaoula, Abdelhak; Michler, J.; Nelis, Thomas (2022). Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films Surface and Coatings Technology, 450, p. 129002. Elsevier 10.1016/j.surfcoat.2022.129002

Sturm, Patrick

Hain, Caroline; Schweizer, Peter; Sturm, Patrick; Brozi, Aurelio; Thomet, Jonathan; Micher, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2023). Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation Surface and Coatings Technology, 454, p. 129188. Elsevier 10.1016/j.surfcoat.2022.129188

Taylor, Aidan A.

Schoeppner, Rachel L.; Putz, Barbara; Taylor, Aidan A.; Pethö, Laszlo; Keith, Thomas; Antonin, Olivier; Nelis, Thomas; Michler, Johann (2021). Combinatorial Materials Design Approach to Investigate Adhesion Layer Chemistry for Optimal Interfacial Adhesion Strength Crystals, 11(357) MDPI https://doi.org/10.3390/cryst11040357

Thomet, Jonathan

Hain, Caroline; Schweizer, Peter; Sturm, Patrick; Brozi, Aurelio; Thomet, Jonathan; Micher, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2023). Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation Surface and Coatings Technology, 454, p. 129188. Elsevier 10.1016/j.surfcoat.2022.129188

Weiss, Robert

Hain, Caroline; Brown, David; Welsh, Alexander; Wieczerzak, Krzystof; Weiss, Robert; Michler, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2022). From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films Surface and Coatings Technology, 432, p. 127928. Elsevier 10.1016/j.surfcoat.2021.127928

Welsh, Alexander

Hain, Caroline; Brown, David; Welsh, Alexander; Wieczerzak, Krzystof; Weiss, Robert; Michler, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2022). From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films Surface and Coatings Technology, 432, p. 127928. Elsevier 10.1016/j.surfcoat.2021.127928

Wieczerzak, K.

Lapeyre, L.; Wieczerzak, K.; Hain, Caroline; Metzger, J.; Sharma, A.; Bensaoula, Abdelhak; Michler, J.; Nelis, Thomas (2022). Influence of HiPIMS pulse widths on the deposition behaviour and properties of CuAgZr compositionally graded films Surface and Coatings Technology, 450, p. 129002. Elsevier 10.1016/j.surfcoat.2022.129002

Wieczerzak, Krzystof

Hain, Caroline; Brown, David; Welsh, Alexander; Wieczerzak, Krzystof; Weiss, Robert; Michler, Johann; Hessler-Wyser, Aicha; Nelis, Thomas (2022). From pulsed-DCMS and HiPIMS to microwave plasma-assisted sputtering: Their influence on the properties of diamond-like carbon films Surface and Coatings Technology, 432, p. 127928. Elsevier 10.1016/j.surfcoat.2021.127928

Xomalis, Angelos

Xomalis, Angelos; Hain, Caroline; Groetsch, Alexander; Klimashin, Fedor F.; Nelis, Thomas; Michler, Johann; Schwiedrzik, Jakob (2023). Resist-Free E-beam Lithography for Patterning Nanoscale Thick Films on Flexible Substrates ACS Applied Nano Material, 6(5), pp. 3388-3394. American Chemical Society 10.1021/acsanm.2c05161

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