Nicolet, M.A.M.A.NicoletRyser, M.M.RyserRomano, ValerioValerioRomano2024-11-192024-11-1920151432-063010.24451/arbor.5548https://doi.org/10.24451/arbor.554810.1007/s00339-014-8931-0https://arbor.bfh.ch/handle/arbor/33394enElectrical resistivity change in amorphous Ta42Si13N45 films by stress relaxation-article