Control of the nitrogen content in nanocomposite TiN/SiN coatings deposited by an arc-sputter hybrid process

Haug, F.-J.; Bonderer, L.; Schwaller, Patrick; Patscheider, J.; Tobler, M.; Karimi, A. (2005). Control of the nitrogen content in nanocomposite TiN/SiN coatings deposited by an arc-sputter hybrid process Composites Science and Technology, 65(5), pp. 799-803. Elsevier 10.1016/j.compscitech.2004.10.013

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We have developed a reactive hybrid process for the deposition of TiN/SiNx composite layers where titanium is eroded from a conventional, industrial arc source and silicon is simultaneously sputtered from a magnetron target in argon/nitrogen atmosphere. The Si/N ratio of the SiNx phase in the film is related to the nitridation state of the silicon target which in turn is controlled by the Ar/N2 mixture. Monitoring the characteristics of the silicon target allows an effective control of the process. Nanocomposite TiN/SiNx coatings show enhanced protective properties compared to coatings of pure TiN because the addition of silicon results in an improved oxidation resistance. The improvement depends on the stoichiometry of the SiNx phase which controls the crosslinking in the matrix and to the TiN grains. In composites with insufficient nitridation of the SiNx phase no improvement of the hardness is observed.

Item Type:	Journal Article (Original Article)
Division/Institute:	School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS School of Engineering and Computer Science
Name:	Haug, F.-J.; Bonderer, L.; Schwaller, Patrick; Patscheider, J.; Tobler, M. and Karimi, A.
ISSN:	0266-3538
Publisher:	Elsevier
Language:	English
Submitter:	Patrick Schwaller
Date Deposited:	10 Dec 2019 09:22
Last Modified:	10 Dec 2019 09:22
Publisher DOI:	10.1016/j.compscitech.2004.10.013
ARBOR DOI:	10.24451/arbor.9306
URI:	https://arbor.bfh.ch/id/eprint/9306