Selective electrochemical gold deposition onto p-Si (1 0 0) surfaces

Santinacci, L.; Djenizian, T.; Schwaller, Patrick; Suter, T.; Etcheberry, A.; Schmuki, P. (2008). Selective electrochemical gold deposition onto p-Si (1 0 0) surfaces Journal of Physics D: Applied Physics, 41(17), p. 175301. Institute of Physics Publishing (IOP) 10.1088/0022-3727/41/17/175301

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In this paper, we report selective electrochemical gold deposition onto p-type Si (1 0 0) into nanoscratches produced through a thin oxide layer using an atomic force microscope. A detailed description of the substrate engraving process is presented. The influence of the main scratching parameters such as the normal applied force, the number of scans and the scanning velocity are investigated as well as the mechanical properties of the substrate. Gold deposition is carried out in a KAu(CN)2 + KCN solution by applying cathodic voltages for various durations. The gold deposition process is investigated by cyclic voltammetry. Reactivity enhancement at the scratched locations was studied by comparing the electrochemical behaviour of intact and engraved surfaces using a micro-electrochemical setup. Selective electrochemical gold deposition is achieved: metallic patterns with a sub-500 nm lateral resolution are obtained demonstrating, therefore, the bearing potential of this patterning technique.

Item Type:	Journal Article (Original Article)
Division/Institute:	School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS School of Engineering and Computer Science
Name:	Santinacci, L.; Djenizian, T.; Schwaller, Patrick; Suter, T.; Etcheberry, A. and Schmuki, P.
ISSN:	0022-3727
Publisher:	Institute of Physics Publishing (IOP)
Language:	German
Submitter:	Patrick Schwaller
Date Deposited:	30 Mar 2020 10:09
Last Modified:	30 Mar 2020 10:09
Publisher DOI:	10.1088/0022-3727/41/17/175301
ARBOR DOI:	10.24451/arbor.9300
URI:	https://arbor.bfh.ch/id/eprint/9300