From ps to fs: Dependence of the material removal rate and the surface quality on the pulse duration for metals, semiconductors and oxides
Version
Published
Date Issued
2012
Author(s)
Type
Conference Paper
Language
English
Subjects
QC Physics
ISBN
978-0-912035-96-3
Publisher DOI
Conference
ICALEO® 2012: 31st International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing
Publisher
Laser Institute of America
Submitter
Neuenschwander, Beat
Citation apa
Neuenschwander, B., Jaeggi, B., & Schmid, M. (2012). From ps to fs: Dependence of the material removal rate and the surface quality on the pulse duration for metals, semiconductors and oxides. ICALEO® 2012: 31st International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing. Laser Institute of America. https://doi.org/10.24451/arbor.11320
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Manuscript_M1004.pdf
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accepted
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673.69 KB
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