Electrical resistivity change in amorphous Ta42Si13N45 films by stress relaxation

URI
Version
Published
Date Issued
2015
Author(s)
Nicolet, M.A.
Ryser, M.
Type
Article
Language
English
DOI
Publisher DOI
Journal
Applied Physics
ISSN
1432-0630
Organization
Volume
118
Issue
3
Publisher
Springer
Submitter
ServiceAccount
Citation apa
Nicolet, M. A., Ryser, M., & Romano, V. (2015). Electrical resistivity change in amorphous Ta42Si13N45 films by stress relaxation. In Applied Physics (Vol. 118, Issue 3). Springer. https://doi.org/10.24451/arbor.5548
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