In situ SEM indentation experiments: Instruments, methodology, and applications
Version
Published
Date Issued
2009
Author(s)
Type
Article
Language
English
Abstract
The purpose of this article is to present the design and capabilities of two in situ scanning electron microscope (SEM) indentation instruments covering a large load range from μN to N. The capabilities and advantages of in situ SEM indentation are illustrated by two applications: indentation of a thin film and a nanowire. All the experiments were performed on electrodeposited cobalt, whose outstanding magnetic properties make it a candidate material for MEMS and NEMS devices
Publisher DOI
Journal
Microscopy Research and Technique
ISSN
1059-910X
Volume
72
Issue
3
Publisher
Wiley-Blackwell - STM
Submitter
SchwallerP
Citation apa
Ghisleni, R., Rzepiejewska-Malyska, K., Laetitia, P., Schwaller, P., & Michler, J. (2009). In situ SEM indentation experiments: Instruments, methodology, and applications. In Microscopy Research and Technique (Vol. 72, Issue 3). Wiley-Blackwell - STM. https://doi.org/10.24451/arbor.9293
File(s)![Thumbnail Image]()
Loading...
Name
In situ SEM indentation experiments.pdf
License
Publisher
Version
published
Size
255.63 KB
Format
Adobe PDF
Checksum (MD5)
25c9b8fce82b2353e69ef1a4a1f9e8c6
