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In situ SEM indentation experiments: Instruments, methodology, and applications

URI
https://arbor.bfh.ch/handle/arbor/30936
Version
Published
Date Issued
2009
Author(s)
Ghisleni, Rudy
Rzepiejewska-Malyska, Karolin
Laetitia, Philippe
Schwaller, Patrick  
Michler, Johann
Type
Article
Language
English
Abstract
The purpose of this article is to present the design and capabilities of two in situ scanning electron microscope (SEM) indentation instruments covering a large load range from μN to N. The capabilities and advantages of in situ SEM indentation are illustrated by two applications: indentation of a thin film and a nanowire. All the experiments were performed on electrodeposited cobalt, whose outstanding magnetic properties make it a candidate material for MEMS and NEMS devices
DOI
10.24451/arbor.9293
https://doi.org/10.24451/arbor.9293
Publisher DOI
10.1002/jemt.20677
Journal
Microscopy Research and Technique
ISSN
1059-910X
Organization
Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS  
Technik und Informatk  
Volume
72
Issue
3
Publisher
Wiley-Blackwell - STM
Submitter
SchwallerP
Citation apa
Ghisleni, R., Rzepiejewska-Malyska, K., Laetitia, P., Schwaller, P., & Michler, J. (2009). In situ SEM indentation experiments: Instruments, methodology, and applications. In Microscopy Research and Technique (Vol. 72, Issue 3). Wiley-Blackwell - STM. https://doi.org/10.24451/arbor.9293
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