A novel Model for the Mechanism of Laser-Induced Back Side Wet Etching in Aqueous Cu Solutions using ns Pulses at 1064nm
Version
Published
Date Issued
2011
Author(s)
Type
Article
Language
English
Abstract
Laser induced back side wet etching has shown to be a promising tool for the micro-structuring of transparent materials. Detailed studies have been performed using UV excimer laser sources, aromatic hydrocarbon and liquid metal absorbers. Only little work is reported however using aqueous Cu solutions as absorbers and ns laser pulses at 1064 nm wavelength. We present a novel
model for this specific setup. Our experiments indicate that physisorbed Cu2+ ions at the polar glass surface absorb the laser light. This leads to local thermal stresses in the glass and subsequent micro-ablation.
model for this specific setup. Our experiments indicate that physisorbed Cu2+ ions at the polar glass surface absorb the laser light. This leads to local thermal stresses in the glass and subsequent micro-ablation.
Publisher DOI
Journal
Physics Procedia
ISSN
1875-3892
Volume
12
Publisher
Elsevier
Submitter
SchwallerP
Citation apa
Schwaller, P., Zehnder, S., von Arx, U., & Neuenschwander, B. (2011). A novel Model for the Mechanism of Laser-Induced Back Side Wet Etching in Aqueous Cu Solutions using ns Pulses at 1064nm. In Physics Procedia (Vol. 12). Elsevier. https://doi.org/10.24451/arbor.9266
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A novel Model for the Mechanism of Laser Induced Back side wet etching in aquesou cu solutions using ns pulses at 1064nm.pdf
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