Stoichiometry dependence of hardness, elastic properties, and oxidation resistance in TiN/SiNx nanocomposites deposited by a hybrid process

Haug, F.-J.; Schwaller, Patrick; Wloka, J.; Patscheider, J.; Karimi, A.; Tobler, M. (2004). Stoichiometry dependence of hardness, elastic properties, and oxidation resistance in TiN/SiNx nanocomposites deposited by a hybrid process Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 22(4), pp. 1229-1234. American Vacuum Society (AVS) 10.1116/1.1763907

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TiN/SiNx nanocomposite layers with Si contents between 0 and 25 at. % were deposited by a reactive arc-magnetron sputtering hybrid process. The stoichiometry of the SiNx phase was found to be related to the silicon sputter target state, i.e., elemental or nitrided. TiN/SiNx layers with a Si:N ratio close to 0.75 (silicon nitride) show a hardness maximum at overall Si contents between 5 and 7 at. %. The hardness maximum is absent for nitrogen deficient stoichiometries of SiNx. The oxidation resistance of the composite layers is three to five times better than that of pure TiN. In contrast to the effect of the stoichiometry on hardness, the oxidation resistance depends on the overall silicon content only, regardless of stoichiometry.

Item Type:

Journal Article (Original Article)

Division/Institute:

Department of Engineering and Information Technology
Department of Engineering and Information Technology > Institute for Applied Laser, Photonics and Surface Technologies

Name:

Haug, F.-J.; Schwaller, Patrick; Wloka, J.; Patscheider, J.; Karimi, A. and Tobler, M.

ISSN:

0734-2101

Publisher:

American Vacuum Society (AVS)

Language:

English

Submitter:

Patrick Schwaller

Date Deposited:

04 Mar 2020 14:58

Last Modified:

04 Mar 2020 14:58

Publisher DOI:

10.1116/1.1763907

ARBOR DOI:

10.24451/arbor.9304

URI:

https://arbor.bfh.ch/id/eprint/9304

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