Ghisleni, Rudy; Rzepiejewska-Malyska, Karolin; Laetitia, Philippe; Schwaller, Patrick; Michler, Johann (2009). In situ SEM indentation experiments: Instruments, methodology, and applications Microscopy Research and Technique, 72(3), pp. 242-249. Wiley-Blackwell - STM 10.1002/jemt.20677
Text
In situ SEM indentation experiments.pdf - Published Version Restricted to registered users only Available under License Publisher holds Copyright. Download (261kB) | Request a copy |
The purpose of this article is to present the design and capabilities of two in situ scanning electron microscope (SEM) indentation instruments covering a large load range from μN to N. The capabilities and advantages of in situ SEM indentation are illustrated by two applications: indentation of a thin film and a nanowire. All the experiments were performed on electrodeposited cobalt, whose outstanding magnetic properties make it a candidate material for MEMS and NEMS devices
Item Type: |
Journal Article (Original Article) |
---|---|
Division/Institute: |
School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS School of Engineering and Computer Science |
Name: |
Ghisleni, Rudy; Rzepiejewska-Malyska, Karolin; Laetitia, Philippe; Schwaller, Patrick and Michler, Johann |
ISSN: |
1059-910X |
Publisher: |
Wiley-Blackwell - STM |
Language: |
English |
Submitter: |
Patrick Schwaller |
Date Deposited: |
17 Dec 2019 12:30 |
Last Modified: |
17 Dec 2019 12:30 |
Publisher DOI: |
10.1002/jemt.20677 |
ARBOR DOI: |
10.24451/arbor.9293 |
URI: |
https://arbor.bfh.ch/id/eprint/9293 |