Structure of sputtered nanocomposite CrC[sub x]∕a-C:H thin films

Gassner, G.; Patscheider, J.; Mayrhofer, P. H.; Hegedus, E.; Tóth, L.; Kovacs, I.; Pécz, B.; Srot, V.; Scheu, Ch.; Mitterer, C. (2006). Structure of sputtered nanocomposite CrC[sub x]∕a-C:H thin films Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 24(4), p. 1837. 10.1116/1.2216713

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This work presents the structural evolution of nanocomposite CrCx∕a-C:H coatings prepared by unbalanced magnetron sputtering of a metallic Cr target in Ar+CH4 glow discharges using low negative dc bias voltages. Raman spectroscopy and x-ray photoelectron spectroscopy were used to characterize the phase composition and the chemical bonding in the films deposited at different experimental conditions. The results were correlated to the chemical composition obtained by elastic recoil detection analysis. The coating microstructure was investigated on selected samples by high-resolution transmission electron microscopy combined with electron energy-loss spectroscopy analysis. The nanocomposite coatings can be divided into hard CrCx dominated films, when prepared at low CH4 partial pressure to total pressure (pt) ratios (pCH4/pt<0.4), and into low-friction a-C:H dominated films, when prepared at pCH4/pt>0.4. The structure of the low-friction a-C:H dominated coatings consists of 2–10nm sized fcc CrC crystallites embedded in a Cr containing a-C:H matrix.

Item Type:

Journal Article (Original Article)

Division/Institute:

School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS
School of Engineering and Computer Science

Name:

Gassner, G.;
Patscheider, J.;
Mayrhofer, P. H.;
Hegedus, E.;
Tóth, L.;
Kovacs, I.;
Pécz, B.;
Srot, V.;
Scheu, Ch. and
Mitterer, C.

ISSN:

1071-1023

Language:

English

Submitter:

Patrick Schwaller

Date Deposited:

09 Dec 2019 16:57

Last Modified:

09 Dec 2019 16:57

Publisher DOI:

10.1116/1.2216713

URI:

https://arbor.bfh.ch/id/eprint/9275

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