Structural, electrical, and mechanical properties of nc-TiC∕a-SiC nanocomposite thin films

Eklund, P.; Emmerlich, J.; Högberg, H.; Wilhelmsson, O.; Isberg, P.; Birch, J.; Persson, P. O. Å.; Jansson, U.; Hultman, L. (2005). Structural, electrical, and mechanical properties of nc-TiC∕a-SiC nanocomposite thin films Journal of Vacuum Science & Technology B, 23(6), p. 2486. American Vacuum Society (AVS) 10.1116/1.2131081

Full text not available from this repository. (Request a copy)

We have synthesized Ti–Si–C nanocomposite thin films by dc magnetron sputtering from a Ti3SiC2 compound target in an Ar discharge on Si(100), Al2O3(0001), and Al substrates at temperatures from room temperature to 300°C. Electron microscopy, x-ray diffraction, and x-ray photoelectron spectroscopy showed that the films consisted of nanocrystalline (nc-) TiC and amorphous (a-) SiC, with the possible presence of a small amount of noncarbidic C. The growth mode was columnar, yielding a nodular film-surface morphology. Mechanically, the films exhibited a remarkable ductile behavior. Their nanoindentation hardness and E-modulus values were 20 and 290GPa, respectively. The electrical resistivity was 330μΩcm for optimal Ar pressure (4mTorr) and substrate temperature (300°C). The resulting nc-TiC∕a-SiC films performed well as electrical contact material. These films’ electrical-contact resistance against Ag was remarkably low, 6μΩ at a contact force of 800N compared to 3.2μΩ for Ag against Ag. The chemical stability of the nc-TiC∕a-SiC films was excellent, as shown by a Battelle flowing mixed corrosive-gas test, with no N, Cl, or S contaminants entering the bulk of the films.

Item Type:

Journal Article (Original Article)

Division/Institute:

School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS
School of Engineering and Computer Science

Name:

Eklund, P.;
Emmerlich, J.;
Högberg, H.;
Wilhelmsson, O.;
Isberg, P.;
Birch, J.;
Persson, P. O. Å.;
Jansson, U. and
Hultman, L.

ISSN:

0734-211X

Publisher:

American Vacuum Society (AVS)

Language:

English

Submitter:

Patrick Schwaller

Date Deposited:

09 Dec 2019 16:57

Last Modified:

09 Dec 2019 16:57

Publisher DOI:

10.1116/1.2131081

URI:

https://arbor.bfh.ch/id/eprint/9273

Actions (login required)

View Item View Item
Provide Feedback