Zehnder, S.; Schwaller, Patrick; von Arx, U.; Bucher, Guido; Neuenschwander, Beat (2011). Micro structuring of transparent materials with NIR ns-laser pulses Physics Procedia, 12, pp. 195-200. Elsevier 10.1016/j.phpro.2011.03.122
|
Text
Micro structuring of transparent materials with NIR ns-laser pulses.pdf - Published Version Available under License Creative Commons: Attribution-Noncommercial-No Derivative Works (CC-BY-NC-ND). Download (1MB) | Preview |
A current challenge in laser processing is high precision micromachining of transparent materials, e.g. to manufacture micro-optical elements. This can be achieved amongst others by using laser induced backside wet etching. Research has been done by several groups in the last years. Most of the published results were obtained by using UV excimer lasers. Our approach deals withthe implementation of the technique for NIR laser sources. We investigated the effects of different pulse widths and repetitionrates on laser induced back side wet etching for 1064nm wavelength and for different absorbers.
Item Type: |
Journal Article (Original Article) |
|---|---|
Division/Institute: |
School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS School of Engineering and Computer Science |
Name: |
Zehnder, S.; Schwaller, Patrick; von Arx, U.; Bucher, Guido and Neuenschwander, Beat  0000-0001-9715-8557 |
ISSN: |
1875-3892 |
Publisher: |
Elsevier |
Language: |
English |
Submitter: |
Patrick Schwaller |
Date Deposited: |
10 Dec 2019 09:08 |
Last Modified: |
04 Nov 2021 21:46 |
Publisher DOI: |
10.1016/j.phpro.2011.03.122 |
ARBOR DOI: |
10.24451/arbor.9267 |
URI: |
https://arbor.bfh.ch/id/eprint/9267 |
Actions (login required)
 |
View Item |