A novel Model for the Mechanism of Laser-Induced Back Side Wet Etching in Aqueous Cu Solutions using ns Pulses at 1064nm

Schwaller, Patrick; Zehnder, S.; von Arx, U.; Neuenschwander, Beat (2011). A novel Model for the Mechanism of Laser-Induced Back Side Wet Etching in Aqueous Cu Solutions using ns Pulses at 1064nm Physics Procedia, 12, pp. 188-194. Elsevier 10.1016/j.phpro.2011.03.121

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Laser induced back side wet etching has shown to be a promising tool for the micro-structuring of transparent materials. Detailed studies have been performed using UV excimer laser sources, aromatic hydrocarbon and liquid metal absorbers. Only little work is reported however using aqueous Cu solutions as absorbers and ns laser pulses at 1064 nm wavelength. We present a novel model for this specific setup. Our experiments indicate that physisorbed Cu2+ ions at the polar glass surface absorb the laser light. This leads to local thermal stresses in the glass and subsequent micro-ablation.

Item Type:	Journal Article (Original Article)
Division/Institute:	School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS School of Engineering and Computer Science
Name:	Schwaller, Patrick; Zehnder, S.; von Arx, U. and Neuenschwander, Beat0000-0001-9715-8557
ISSN:	1875-3892
Publisher:	Elsevier
Language:	English
Submitter:	Patrick Schwaller
Date Deposited:	10 Dec 2019 09:06
Last Modified:	04 Nov 2021 21:46
Publisher DOI:	10.1016/j.phpro.2011.03.121
ARBOR DOI:	10.24451/arbor.9266
URI:	https://arbor.bfh.ch/id/eprint/9266