Resist-Free E-beam Lithography for Patterning Nanoscale Thick Films on Flexible Substrates

Xomalis, Angelos; Hain, Caroline; Groetsch, Alexander; Klimashin, Fedor F.; Nelis, Thomas; Michler, Johann; Schwiedrzik, Jakob (2023). Resist-Free E-beam Lithography for Patterning Nanoscale Thick Films on Flexible Substrates ACS Applied Nano Material, 6(5), pp. 3388-3394. American Chemical Society 10.1021/acsanm.2c05161

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Resist-based lithographic tools, such as electron beam (e-beam) and photolithography, drive today’s state-of-the-art nanoscale fabrication. However, the multistep nature of these processes, expensive resists, and multiple other consumables limit their potential for cost-effective nanotechnology. Here, we report a one-step, resist-free, and scalable methodology for directly structuring thin metallic films on flexible polymeric substrates via e-beam patterning. Controlling e-beam dose results in nanostructures as small as 5 nm in height with a sub-micrometer lateral resolution. We structure nanoscale thick films (100 nm) of Al, TiN, and Au on standard Kapton tape to highlight the universal use of our nanopatterning methodology. Further, we utilize direct e-beam writing to create various high-resolution biomimetic surfaces directly onto ceramic thin films. In addition, we assemble architectured mechanical metamaterials comprising crack “traps”, which confine cracks and prevent overall material/device failure. Such a resist-free lithographic tool can reduce fabrication cost dramatically and may be used for different applications varying from biomimetic and architectured metamaterials to strain-resilient flexible electronics and wearable devices.

Item Type:

Journal Article (Original Article)

Division/Institute:

School of Engineering and Computer Science > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS > ALPS / Plasma Surface Engineering
School of Engineering and Computer Science

Name:

Xomalis, Angelos;
Hain, Caroline;
Groetsch, Alexander;
Klimashin, Fedor F.;
Nelis, Thomas;
Michler, Johann and
Schwiedrzik, Jakob

Subjects:

Q Science > QC Physics

ISSN:

1936-0851

Publisher:

American Chemical Society

Language:

English

Submitter:

Thomas Nelis

Date Deposited:

01 Mar 2023 10:13

Last Modified:

11 Mar 2023 01:30

Publisher DOI:

10.1021/acsanm.2c05161

Uncontrolled Keywords:

Thin-film, e-beam, nanopatterning, biomimetic, architectured materials, metamaterials, crack-suppression, strain-resilient

URI:

https://arbor.bfh.ch/id/eprint/18868

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