From ps to fs: Dependence of the material removal rate and the surface quality on the pulse duration for metals, semiconductors and oxides

Neuenschwander, Beat; Jaeggi, Beat; Schmid, Marc (2012). From ps to fs: Dependence of the material removal rate and the surface quality on the pulse duration for metals, semiconductors and oxides In: ICALEO® 2012: 31st International Congress on Laser Materials Processing, Laser Microprocessing and Nanomanufacturing (pp. 959-968). Laser Institute of America 10.2351/1.5062570

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Item Type:

Conference or Workshop Item (Paper)

Division/Institute:

Engineering and Information Technology > Institute for Surface Applied Laser, Phototonics and Surface Technologies ALPS

Name:

Neuenschwander, Beat;
Jaeggi, Beat and
Schmid, Marc

Subjects:

Q Science > QC Physics

ISBN:

978-0-912035-96-3

Publisher:

Laser Institute of America

Language:

English

Submitter:

Beat Neuenschwander

Date Deposited:

21 Apr 2020 12:08

Last Modified:

21 Apr 2020 12:25

Publisher DOI:

10.2351/1.5062570

Additional Information:

This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing

ARBOR DOI:

10.24451/arbor.11320

URI:

https://arbor.bfh.ch/id/eprint/11320

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